Tantalum (Ta)
- Description
Description
Tantalum is a very hard, ductile, lustrous, blue-gray transition metal. It is used for heating elements and heat shields in high-temperature vacuum furnaces, as well as a crucible material for many high-temperature applications
Tantalum and its alloys are used in specialized aerospace and nuclear applications and have found increasing use in military components such as anti-armor weapon systems.
High purity tantalum is used to manufacture sputtering targets for the physical vapor deposition (PVD) process. The targets deposit onto semiconductor substrates to form a thin film diffusion barrier to protect the copper interconnects. Tantalum sputtering targets are also used in a variety of other products including magnetic storage media, inkjet printer heads and flat panel displays and so on.
General Properties
| Symbol | Ta |
|---|---|
| CAS Number | 7440-25-7 |
| EINECS Number | 231-135-5 |
| Atomic Number | 73 |
| Atomic Mass | 180.94788 u |
| Density | 16.65 g/cc |
| Melting Point | 3017 °C |
| Boiling Point | 5458 °C |
| Thermal Conductivity | 57.5 W/(m⋅K) |
| Electrical Resistivity | 131 nΩ⋅m (at 20 °C) |
| Electronegativity | Pauling scale 1.5 |
| Heat of Vaporization | 753 kJ/mol |
| Heat of Fusion | 36.57 kJ/mol |
Specifications
For high purity Tantalum (Ta) metal, we have it with the following:
| Metal Name | Tantalum (Ta)) metal |
| Purity | Up to 99.99% (4N) |
| Forms | Small pellet and rod sizes or other forms and sizes |
| Package | Vacuum-sealed |
If you are in need of high purity Tantalum metal, please contact us for details at sales@american-gmg.com.
