Gallium (II) Telluride (GaTe), also known as Gallium Telluride, is a binary compound composed of gallium and tellurium. As a layered III–VI semiconductor, GaTe exhibits strong anisotropy, a direct bandgap, and excellent optoelectronic properties, making it valuable for advanced electronic and photonic applications.

Highpurity GaTe is widely used in the production of sputtering targets and serves as a highquality source material for semiconductor fabrication, including chemical vapor deposition (CVD) and physical vapor deposition (PVD) processes. These deposition techniques enable the formation of highperformance thin films used in display technologies, optical coatings, and infrared devices.

Highpurity GaTe is also utilized as a source material for molecular beam epitaxy (MBE), supporting semiconductor research and device productions as well as development of nextgeneration electronic and optoelectronic devices.

Additional Applications of HighPurity GaTe

General Properties 

PropertiesValue
FormulaGaTe
CAS Number12024-14-5
EC / EINECS Number234-690-1
Molar mass97.32 g/mol
Melting point824 °C (1,515 °F; 1,097 K)
Density5.44 g/cm3, solid
Band Gap~1.67 eV
Crystal structureMonoclinic

Product Availability

We provide high-purity Gallium Telluride (GaTe) tailored for semiconductor and industrial requirements. 

Purity Up to 99.9999%
FormsChunks of 2-8mm or other forms
Package Small packs, vacuum-sealed

If you require any of this high-purity metal, please contact our sales team for details at sales@american-gmg.com.